Anisotropic Etch Simulator for MEMS

 

The NNIN at the University of Michigan will be hosting a presentation on ” Anisotropic Etch Simulator for MEMS”, which will be broadcast live as a web based seminar.
Click below to register to view this event broadcast.

Event Information

Topic: Anisotropic Etch Simulator for MEMS

Date:  August 29th, 2012

Time: 11:00 am – 12:00 pm

Presenter: Mr Joe Johnson

Bio:

Joe Johnson is the Business Development Manager at IntelliSense. He has a broad knowledge base that spans MEMS design, CAD/FEA simulation, and customer education/training. Joe has been instrumental in fostering IntelliSense’s global business relationships and bringing value to IntelliSense’s clients and partners. Joe has extensive CAD expertise and strong mechanical/structural engineering. He has collaborated on a broad array of customer design projects including inertial sensors, thermal actuators, and fluidic devices. Joe holds a degree in Mechanical Engineering from MIT.

Overview: IntelliSuite was the first MEMS-specific CAD tool and has been under active development for over 20 years. In this webinar, explore and understand how IntelliEtch, a powerful anisotropic etch simulator, can help MEMS designers and process engineers save time and cost in their etching processes while helping professors teach their students about advanced etching techniques. This webinar will cover: simulation of wet etching for silicon and quartz, etching of high-order planes, experimental validation of the program’s accuracy, simulating composite multi-mask MEMS processes, simulation speed enhancement through GPU-based processing, and discussion of the new features and capabilities available in the latest IntelliEtch release.

 

Event Flyer
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Questions regarding this event or other NNIN activity?
Feel free to contact NNIN/C for this event or other activities:

Behrouz Shiari, bshiari@umich.edu

Parameshwaran Pasupathy, paramesh@umich.edu