2019-05 PlasmaTherm RIE Workshop

**** Please Note ****

The room has been changed to FXB 1109

Technical workshop organized by Plasmatherm on the fundamentals of plasma etching. Lectures will include the basics of plasma reactors and mechanisms for etching and deposition and review state of-the-art etching and deposition technologies as applied to semiconductor, MEMS, and nanofabrication. Talks will cover compound semiconductor, dielectric, and deep silicon etching. Fundamental and new ideas for endpoint detection and sample thermal budget management will also be presented.

PlasmaTherm General Flyer
PlasmaTherm Agenda Flyer_Page_1

PlasmaTherm Agenda Flyer Rev

Smart Start agenda

At the end of the Smart Start day, you will have fully completed the LNF access procedure and will be ready to work in the lab.

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Questions regarding this event or other LNF activity?
Feel free to contact us:
Pilar Herrera-Fierro, or info@LNF.umich.edu