The Lurie Nanofabrication Facility (LNF) is more than 12,500 square feet (area under filter) of state-of-the-art class 10/100/1000 and 10,000 cleanroom installations with up to 6” (150mm) processing capability and is available on a fee basis for use by research groups from industry and universities. The LNF supports a comprehensive blend of process technology (e.g. lithography, deposition and etch) and metrology tools (e.g. SEM, spectroscopic ellipsometry, Hall, AFM, and profilometry) that support traditional and non-traditional research objectives.
Complete Fabrication Capabilities for:
More than 12,500 square feet (area under filter) of state-of-the-art class 10/100/1000 and 10,000 cleanroom installations with up to 6” (150mm) processing capability.
The NNIN at Michigan provides open discussions with Domain Experts as below, and also provides comprehensive training to users to allow 24/7 access to the comprehensive suite of tools that support
- General Processing, Silicon, Compound
- Semiconductors, Polymers, and other
- Non-Silicon Materials
- MEMS, BioMEMS, Integrated Microsystems
- CMOS, MEMS-CMOS Integration
Domain Experts for:
- General Micro/Nanofabrication
- MEMS, BioMEMS, and Integrated Microsystems
- Computation and Modeling of MEMS/NEMS and
- Micro/Nanofluidic structures
- Geosciences and Environmental Sciences and Sensors
- Photonics, Compound Semiconductors and Quantum Systems